Electrodeposited CoFeCu films at high and low pH levels: structural and magnetic properties


KÖÇKAR H., Ozergin E., KARAAĞAÇ Ö., ALPER M. , KURU H., Haciismailoglu M.

JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, vol.26, no.4, pp.2090-2094, 2015 (Journal Indexed in SCI) identifier identifier

  • Publication Type: Article / Article
  • Volume: 26 Issue: 4
  • Publication Date: 2015
  • Doi Number: 10.1007/s10854-014-2652-1
  • Title of Journal : JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
  • Page Numbers: pp.2090-2094

Abstract

CoFeCu films were electrodeposited at high and low pH, and their structural, magnetic and magnetoresistance properties were studied. Current-time transients were recorded to observe the proper deposition of the films. Crystal structure was displayed with X-ray diffraction. All films had a face centered cubic structure and the crystal structure was dominated by fcc-Co. The morphology and elemental composition of the films were determined by scanning electron microscope and energy dispersive X-ray spectroscopy, respectively. The surface of the film deposited at low pH has larger roundish shapes than that of the film deposited at high pH. The saturation magnetization increases from 1,210 to 1,413 emu/cm(3) and coercivity increases from 29 to 39 Oe as the electrolyte pH increases. All CoFeCu films showed anisotropic magnetoresistance. It is seen that electrolyte pH has an substantial affect on the morphological and magnetic properties of the films.