The effect of different chemical compositions caused by the variation of deposition potential on properties of Ni-Co films

Karpuz A., KÖÇKAR H., ALPER M.

APPLIED SURFACE SCIENCE, vol.257, no.8, pp.3632-3635, 2011 (SCI-Expanded) identifier identifier

  • Publication Type: Article / Article
  • Volume: 257 Issue: 8
  • Publication Date: 2011
  • Doi Number: 10.1016/j.apsusc.2010.11.092
  • Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Page Numbers: pp.3632-3635
  • Keywords: Electrodeposition, Ni-Co films, Deposition potential, Magnetic properties, Microstructure, CU ALLOY-FILMS, ANISOTROPIC MAGNETORESISTANCE, MAGNETIC-PROPERTIES, ELECTRODEPOSITION, SULFATE, MICROSTRUCTURE
  • Bursa Uludag University Affiliated: Yes


The magnetic and microstructural properties of Ni-Co films electrodeposited at different cathode potentials were investigated. The compositional analysis revealed that the Ni content increases from 13 at.% to 44 at.% in the films with increasing deposition potential. Magnetic measurements showed that the saturation magnetization, M(s) of the films decreased with increase of Ni content as the deposition potential increased. Ms values changed between 1160 emu/cm(3) and 841 emu/cm(3). The X-ray diffraction revealed that the crystalline structure of the films is a mixture of the predominant face-centered cubic (fcc) and hexagonal closed packed. However, the mixture phase turns to the fcc because of increasing Ni content up to 44 at.% at the highest (-1.9 V) potential by enhancing the intensity of reflections from the fcc phase. The changes observed in the magnetic and microstructural properties were ascribed to the changes observed in the chemical composition caused by the applied different deposition potentials. (C) 2010 Elsevier B.V. All rights reserved.