MAGNETORESISTANCE IN ELECTRODEPOSITED NI-FE-CU/CU MULTILAYERS

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ATTENBOROUGH K., HART R., LANE S., ALPER M., SCHWARZACHER W.

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, vol.148, no.1-2, pp.335-336, 1995 (SCI-Expanded, Scopus)

• Publication Type: Article / Article
• Volume: 148 Issue: 1-2
• Publication Date: 1995
• Doi Number: 10.1016/0304-8853(95)89007-6
• Journal Name: JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
• Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus
• Page Numbers: pp.335-336
• Bursa Uludag University Affiliated: No

Abstract

Multilayers of Ni-Fe-Cu/Cu have been electrodeposited from a single electrolyte onto polycrystalline (100) textured and (100) single crystal copper substrates. Bilayer thicknesses as low as 30 Angstrom have been achieved, as confirmed by X-ray diffraction. Room temperature magnetoresistance measurements show the presence of giant magnetoresistance (GMR) and an anisotropic magnetoresistance (AMR) component in the films.