MAGNETORESISTANCE IN ELECTRODEPOSITED NI-FE-CU/CU MULTILAYERS

ATTENBOROUGH, K; HART, R; LANE, SJ; ALPER, MÜRSEL; SCHWARZACHER, W

doi:10.1016/0304-8853(95)89007-6

MAGNETORESISTANCE IN ELECTRODEPOSITED NI-FE-CU/CU MULTILAYERS

ATTENBOROUGH K., HART R., LANE S., ALPER M., SCHWARZACHER W.

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, cilt.148, sa.1-2, ss.335-336, 1995 (SCI-Expanded, Scopus)

Yayın Türü: Makale / Tam Makale
Cilt numarası: 148 Sayı: 1-2
Basım Tarihi: 1995
Doi Numarası: 10.1016/0304-8853(95)89007-6
Dergi Adı: JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus
Sayfa Sayıları: ss.335-336
Bursa Uludağ Üniversitesi Adresli: Hayır

Özet

Multilayers of Ni-Fe-Cu/Cu have been electrodeposited from a single electrolyte onto polycrystalline (100) textured and (100) single crystal copper substrates. Bilayer thicknesses as low as 30 Angstrom have been achieved, as confirmed by X-ray diffraction. Room temperature magnetoresistance measurements show the presence of giant magnetoresistance (GMR) and an anisotropic magnetoresistance (AMR) component in the films.