Effect of potantiostatic waveforms on properties of electrodeposited NiFe alloy films


Kockar H., Alper M., Topcu H.

EUROPEAN PHYSICAL JOURNAL B, vol.42, no.4, pp.497-501, 2004 (SCI-Expanded) identifier identifier

  • Publication Type: Article / Article
  • Volume: 42 Issue: 4
  • Publication Date: 2004
  • Doi Number: 10.1140/epjb/e2005-00008-8
  • Journal Name: EUROPEAN PHYSICAL JOURNAL B
  • Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Page Numbers: pp.497-501
  • Bursa Uludag University Affiliated: No

Abstract

The influence of the deposition potentials applied in continuous and pulse waveforms on the properties of the electrodeposited NiFe alloy films have been investigated. The films were grown on ( 100) textured polycrystalline copper substrates. During growth, the films were characterized by recording the current-time transients. The composition of samples was determined by inductively coupled plasma atomic emission spectrometry (ICP-AES). The analysis results revealed that the Fe content in the films decreases as both the deposition potential and the film thickness increase. The X-ray patterns showed that the films have face centred cubic (fcc) structure as their substrates and the ( 111) texture. The magnetic characteristics of films studied by a vibrating sample magnetometer (VSM) were found to vary depending on the type of the deposition ( pulse or continuous) and the thickness of samples. The easy axis is in the film plane for all samples.