Electrochemically growth and characterization of CuInTe2 chalcopyrite thin films


Keser G., Peksoz A.

JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, vol.31, no.18, pp.15565-15574, 2020 (SCI-Expanded) identifier identifier

  • Publication Type: Article / Article
  • Volume: 31 Issue: 18
  • Publication Date: 2020
  • Doi Number: 10.1007/s10854-020-04120-0
  • Journal Name: JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
  • Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus, Aerospace Database, Applied Science & Technology Source, Chemical Abstracts Core, Communication Abstracts, Compendex, Computer & Applied Sciences, INSPEC, Metadex, Civil Engineering Abstracts
  • Page Numbers: pp.15565-15574
  • Bursa Uludag University Affiliated: Yes

Abstract

Copper indium tellurite (CIT) chalcopyrite compounds were electrochemically grown from an aqueous electrolyte including water-soluble Cu, In, and Te molecular sources onto indium thin oxide-coated glass substrates. CuSO4 center dot 5H(2)O, InCl3, and Na2TeO3 were used as copper, indium, and tellurium sources, respectively. Deposition mechanisms of the CIT thin films are explained by cyclic voltammetry (CV) studies. It is also noted that the effect of deposition potential on the electrical, optical, and structural facilities of the electrodeposited CIT thin films. Energy bandgap of the electrodeposited CIT films is in the range of 0.97-1.83 eV. Stoichiometry of the CIT films deposited at - 0.5, - 0.6, - 0.7, and - 0.8 V is near to CuInTe2. We report that the produced CIT films is polycrystalline nature, and CuInTe(2)is a major chalcopyrite phase corresponding to (1 1 2), (2 0 4), and (1 1 6) directions at 2 theta similar to 25 degrees, 41 degrees, and 49 degrees, respectively. Hall-effect measurements show that the produced CIT thin films have p-type semiconducting conductivity with the acceptor concentration range of 2.8 x 10(17) and 2.8 x 10(18) cm(-3). The variation of the mobility within 20.4-60.2 cm(2)/V s can be explained by the variation of Cu/In ratio within 2.19-0.59. The resistivity of the films is found to vary within 0.011-0.036 Omega cm, which is in good agreement with the literature data.