Parameters affecting microstructure and magnetoresistance of electrodeposited Co-Cu alloy films


Safak M., Alper M., KÖÇKAR H.

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, vol.304, no.2, 2006 (Journal Indexed in SCI) identifier identifier

  • Publication Type: Article / Article
  • Volume: 304 Issue: 2
  • Publication Date: 2006
  • Doi Number: 10.1016/j.jmmm.2006.02.223
  • Title of Journal : JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS

Abstract

Co-Cu alloy films were electrodeposited on polycrystalline Ti substrates under potentiostatic deposition conditions. The crystal structures of the films were studied using X-ray diffraction (XRD). The XRD analysis revealed that the texture of the deposits is dependant on the electrolyte pH, and the Cu content in the electrolyte and hence in the film. The film composition, determined by an inductively coupled plasma atomic emission spectrometry (ICP-AES), was observed to change with the Cu concentration, but was not affected by the electrolyte pH. From magnetoresistance measurements performed at room temperature all the films were noted to exhibit anisotropic behaviour, which can be influenced by both the electrolyte pH and the Cu content of the film. (C) 2006 Elsevier B. V. All rights reserved.