The Effect of Fe Content in Electrodeposited CoFe/Cu Multilayers on Structural, Magnetic and Magnetoresistance Characterizations


Tekgul A., ALPER M., KÖÇKAR H., ŞAFAK HACIİSMAİLOĞLU M., KARAAĞAÇ Ö.

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, vol.10, no.11, pp.7783-7786, 2010 (SCI-Expanded) identifier identifier identifier

  • Publication Type: Article / Article
  • Volume: 10 Issue: 11
  • Publication Date: 2010
  • Doi Number: 10.1166/jnn.2010.2882
  • Journal Name: JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
  • Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Page Numbers: pp.7783-7786
  • Keywords: Electrodeposition, CoFe/Cu Multilayers, XRD, GMR, Magnetic Properties, GIANT MAGNETORESISTANCE
  • Bursa Uludag University Affiliated: Yes

Abstract

A series of CoFe/Cu multilayers were electrodeposited on Ti substrates from the electrolytes containing their metal ion under potentiostatic control, but the Fe concentration in the electrolytes was changed from 0.0125 M to 0.2 M. The deposition was carried out in a three-electrode cell at room temperature. The deposition of Cu layers was made at a cathode potential of -0.3 V with respect to saturated calomel electrode (SCE), while the ferromagnetic CoFe layers were deposited at -1.5 V versus SCE. The structural studies by X-ray diffraction revealed that the multilayers have face-centered-cubic structure. The magnetic characteristics of the films were investigated using a vibrating sample magnetometer and their easy-axis was found to be in film plane. Magnetoresistance measurements were carried out using the Van der Pauw method at room temperature with magnetic fields up to +/- 12 kOe. All multilayers exhibited giant magnetoresistance (GMR) and the GMR values up to 8% were obtained.