Antimicrobial Activity of Ozone against Pathogenic Oral Microorganisms on Different Denture Base Resins


HAYRAN Y., Deniz S. T., Aydin A.

OZONE-SCIENCE & ENGINEERING, vol.42, no.1, pp.43-53, 2019 (SCI-Expanded) identifier identifier

  • Publication Type: Article / Article
  • Volume: 42 Issue: 1
  • Publication Date: 2019
  • Doi Number: 10.1080/01919512.2019.1626215
  • Journal Name: OZONE-SCIENCE & ENGINEERING
  • Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Page Numbers: pp.43-53
  • Keywords: Ozone, acrylic resins, cell viability, denture bases, bacteria, candida albicans, cell survival, SURFACE FREE-ENERGY, CANDIDA-ALBICANS, BIOFILM FORMATION, OZONATED WATER, STREPTOCOCCUS-GORDONII, GASEOUS OZONE, ADHERENCE, EFFICACY, COLONIZATION, MICROBIOTA
  • Bursa Uludag University Affiliated: No

Abstract

The present study aimed to evaluate the antimicrobial effect of gaseous ozone against specific oral pathogens on denture base resins. 1080 round samples were prepared (10mm-diameter, 2mm-thickness). Candida albicans, Streptococcus mutans, Streptococcus gordonii, and Aggregatibacter actinomycetemcomitans, polyamide-Deflex, heat-cured polymethyl-methacrylate (PMMA)-QC-20, and cold-cured-PMMA-Meliodent. The doses and durations: 25, 50 and 100 mu g/ml, 5, 10, 20, 30 minutes. For Cell viability (CV) MTT was used. 100 mu g/ml was most effective dose for C. albicans, S .gordonii, and A. actinomycetemcomitans were in heat-cured-PMMA and polyamide for S.mutans. For polyamide, lowest CV was 43% in S.mutans and A.actinomycetemcomitans. CV of heat-cure and cold-cure PMMA were 31% and 32% in S.gordonii, respectively. CV was similar for all resins and durations in S.mutans and A.actinomycetemcomitans and for polyamide for C.albicans and for heat-cure PMMA for S.gordonii. 30-min ozone application killed 80% of all microorganisms in all resins except for C.albicans in polyamide (65% cell death) and cold-cure PMMA (57% cell death). Optimal dose/duration combination was 100 mu g/ml-10 min. Gaseous ozone can be considered as an effective cleansing agent for denture base resins.